JPS643050B2 - - Google Patents

Info

Publication number
JPS643050B2
JPS643050B2 JP54129761A JP12976179A JPS643050B2 JP S643050 B2 JPS643050 B2 JP S643050B2 JP 54129761 A JP54129761 A JP 54129761A JP 12976179 A JP12976179 A JP 12976179A JP S643050 B2 JPS643050 B2 JP S643050B2
Authority
JP
Japan
Prior art keywords
section
pattern
photomask
reticle
shape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54129761A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5654038A (en
Inventor
Tomohide Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP12976179A priority Critical patent/JPS5654038A/ja
Publication of JPS5654038A publication Critical patent/JPS5654038A/ja
Publication of JPS643050B2 publication Critical patent/JPS643050B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12976179A 1979-10-08 1979-10-08 Checking device for shape of photomask Granted JPS5654038A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12976179A JPS5654038A (en) 1979-10-08 1979-10-08 Checking device for shape of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12976179A JPS5654038A (en) 1979-10-08 1979-10-08 Checking device for shape of photomask

Publications (2)

Publication Number Publication Date
JPS5654038A JPS5654038A (en) 1981-05-13
JPS643050B2 true JPS643050B2 (en]) 1989-01-19

Family

ID=15017537

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12976179A Granted JPS5654038A (en) 1979-10-08 1979-10-08 Checking device for shape of photomask

Country Status (1)

Country Link
JP (1) JPS5654038A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06323188A (ja) * 1993-05-18 1994-11-22 Shin Caterpillar Mitsubishi Ltd エンジンの逆転防止方法

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138135A (en) * 1981-02-20 1982-08-26 Hitachi Ltd Method and apparatus for inspecting pattern
JPS57159023A (en) * 1981-03-27 1982-10-01 Hitachi Ltd Inspecting device of pattern
JPS57196530A (en) * 1981-05-28 1982-12-02 Fujitsu Ltd Inspection of pattern
JPS57206025A (en) * 1981-06-01 1982-12-17 Fujitsu Ltd Pattern inspecting system
JPS5837923A (ja) * 1981-08-31 1983-03-05 Toshiba Corp フオトマスクの検査装置
JPS5846636A (ja) * 1981-09-16 1983-03-18 Nippon Jido Seigyo Kk パタ−ンの欠陥検査装置
JPH0675038B2 (ja) * 1983-03-11 1994-09-21 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン 光学検査装置
JPS60138921A (ja) * 1983-12-27 1985-07-23 Toshiba Corp パタ−ン形状検査装置
JPS60202933A (ja) * 1984-03-16 1985-10-14 Fujitsu Ltd レチクルの検査方法
GB8521393D0 (en) * 1985-08-28 1985-10-02 Exxon Chemical Patents Inc Middle distillate compositions
US5814110A (en) * 1986-09-24 1998-09-29 Exxon Chemical Patents Inc. Chemical compositions and use as fuel additives
US5425789A (en) * 1986-12-22 1995-06-20 Exxon Chemical Patents Inc. Chemical compositions and their use as fuel additives
GB8820295D0 (en) * 1988-08-26 1988-09-28 Exxon Chemical Patents Inc Chemical compositions & use as fuel additives
CN1032221C (zh) * 1990-04-19 1996-07-03 埃克森化学专利公司 馏分燃料添加剂及含该添加剂的馏分燃料

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928841B2 (ja) * 1973-04-17 1984-07-16 オリンパス光学工業株式会社 パタ−ン走査装置
JPS5341030A (en) * 1976-09-25 1978-04-14 Nippon Suidou Setsukeishiya Kk Pipe path equipment for place with large head from upper flow to lower flow
JPS5472975A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Mask inspecting method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06323188A (ja) * 1993-05-18 1994-11-22 Shin Caterpillar Mitsubishi Ltd エンジンの逆転防止方法

Also Published As

Publication number Publication date
JPS5654038A (en) 1981-05-13

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